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Author: Wenyin Liu Publisher: Springer Science & Business Media ISBN: 3540347119 Category : Computers Languages : en Pages : 439
Book Description
This book constitutes the thoroughly refereed post-proceedings of the 6th International Workshop on Graphics Recognition, GREC 2005, held in Hong Kong, China, August 2005. The book presents 37 revised full papers together with a panel discussion report, organized in topical sections on engineering drawings vectorization and recognition, symbol recognition, graphic image analysis, structural document analysis, sketching and online graphics recognition, curves and shape processing, and graphics recognition contest results.
Author: Wenyin Liu Publisher: Springer Science & Business Media ISBN: 3540347119 Category : Computers Languages : en Pages : 439
Book Description
This book constitutes the thoroughly refereed post-proceedings of the 6th International Workshop on Graphics Recognition, GREC 2005, held in Hong Kong, China, August 2005. The book presents 37 revised full papers together with a panel discussion report, organized in topical sections on engineering drawings vectorization and recognition, symbol recognition, graphic image analysis, structural document analysis, sketching and online graphics recognition, curves and shape processing, and graphics recognition contest results.
Author: J.-Y. Xu Publisher: IOS Press ISBN: 1643684833 Category : Technology & Engineering Languages : en Pages : 696
Book Description
Mechatronics and automation technology has led to technological change and innovation in all engineering fields, affecting various disciplines, including machine technology, electronics, and computing. It plays a vital role in improving production efficiency, reducing energy consumption and improving product quality and safety, and will be central to the further advancement of technology and industry, bringing convenience and innovation to even more areas. This book presents the proceedings of ICMAT 2023, the 2nd International Conference on Mechatronics and Automation Technology, held as a virtual event on 27 October 2023. The aim of the conference was to provide a platform for scientists, scholars, engineers and researchers from universities and scientific institutes around the world to share the latest research achievements in mechatronics and automation technology, explore key challenges and research directions, and promote the development and application of theory and technology in this field. A total of 121 submissions were received for the conference, of which 77 were ultimately accepted after a rigorous peer-review process. The papers cover a wide range of topics falling within the scope of mechatronics and automation technology, including smart manufacturing; digital manufacturing; additive manufacturing; robotics; sensors; control; electronic and electrical engineering; intelligent systems; and automation technology, as well as other related fields. Providing an overview of recent developments in mechatronics and automation technology, the book will be of interest to all those working in the field.
Author: Alfred Kwok-Kit Wong Publisher: SPIE Press ISBN: 9780819439956 Category : Science Languages : en Pages : 238
Book Description
Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers
Author: Chris Mack Publisher: John Wiley & Sons ISBN: 1119965071 Category : Technology & Engineering Languages : en Pages : 503
Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author: Qian Liu Publisher: Springer Science & Business Media ISBN: 3642403875 Category : Technology & Engineering Languages : en Pages : 267
Book Description
Novel Optical Technologies for Nanofabrication describes recent advances made in micro/nanofabrication with super-resolution laser technologies, which are based on the latest research findings in the authors’ groups. It focuses on new techniques and methods as well as applications and development trends in laser nanofabrication, including super-resolution laser direct writing, surface structures composed of laser path-guided wrinkle, three-dimensional laser nanofabrication based on two-photon absorption, and nanofabrication by laser interference and surface plasmon polaritons. This book serves as a reference for academic researchers, engineers, technical professionals and graduate students in the fields of micro/nanotechnology, thin film materials, super-resolution optics and laser techniques. Qian Liu is a Professor at Laboratory for Nanodevice, National Center for Nanoscience and Technology, China. Xuanming Duan is a Professor at the Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, China Changsi Peng is a Professor at the Institute of Information Optical Engineering, Soochow University, China.
Author: Bruce W. Smith Publisher: CRC Press ISBN: 1351643444 Category : Technology & Engineering Languages : en Pages : 770
Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author: Jingsong Wei Publisher: Springer Nature ISBN: 9811509433 Category : Science Languages : en Pages : 215
Book Description
This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size. Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc.
Author: Aaron R. Hawkins Publisher: CRC Press ISBN: 142009355X Category : Science Languages : en Pages : 680
Book Description
Optofluidics is an emerging field that involves the use of fluids to modify optical properties and the use of optical devices to detect flowing media. Ultimately, its value is highly dependent on the successful integration of photonic integrated circuits with microfluidic or nanofluidic systems. Handbook of Optofluidics provides a snapshot of the s
Author: Wenyin Liu
Author: Wenyin Liu
Author: Hakan Urey
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Author: J.-Y. Xu
Author: Alfred Kwok-Kit Wong
Author: Chris Mack
Author: Qian Liu
Author: Bruce W. Smith
Author: Jingsong Wei
Author: Aaron R. Hawkins