Excimer Laser Lithography PDF Download

Author: Kanti Jain
Publisher: Society of Photo Optical
ISBN: 9780819402714
Category : Technology & Engineering
Languages : en
Pages : 212

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Book Description

Author: David L. Elliott
Publisher: Academic Press
ISBN: 1483296512
Category : Technology & Engineering
Languages : en
Pages : 350

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Book Description
Ultraviolet Laser Technology and Applications is a hands-on reference text that identifies the main areas of UV laser technology; describes how each is applied; offers clearly illustrated examples of UV opticalsystems applications; and includes technical data on optics, lasers, materials, and systems. This book is unique for its comprehensive, in-depth coverage. Each chapter deals with a different aspect of the subject, beginning with UV light itself; moving through the optics, sources, and systems; and concluding with detailed descriptions of applications in various fields. The text enables practicing engineers and researchers to utilize concepts and innovations to solve actual problems encountered in UV optical technology applications. It also offers a wealth of information for equipment designers and manufacturers. Those in laser fields (including medical, electronics, and semiconductors), students, engineers, technicians, as well as newcomers to the subject who require a basic introduction to the topic, will all find Ultraviolet Laser Technology and Applications to be an essential resource. Serves as a valuable, practical reference to UV laser technology Presents detailed technical data and techniques Offers highly illustrated optics designs and beam delivery systems Includes an extensive bibliography, references, and glossary Covers all major UV laser markets and technology systems

Author: D. O. Filatov
Publisher:
ISBN: 9781617280993
Category : Excimer lasers
Languages : en
Pages :

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Author: Harry J. Levinson
Publisher: SPIE Press
ISBN: 9780819456601
Category : Technology & Engineering
Languages : en
Pages : 446

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Book Description
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Author: Koji Sugioka
Publisher: Springer
ISBN: 9783030636463
Category : Science
Languages : en
Pages : 2071

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Book Description
This handbook provides a comprehensive review of the entire field of laser micro and nano processing, including not only a detailed introduction to individual laser processing techniques but also the fundamentals of laser-matter interaction and lasers, optics, equipment, diagnostics, as well as monitoring and measurement techniques for laser processing. Consisting of 11 sections, each composed of 4 to 6 chapters written by leading experts in the relevant field. Each main part of the handbook is supervised by its own part editor(s) so that high-quality content as well as completeness are assured. The book provides essential scientific and technical information to researchers and engineers already working in the field as well as students and young scientists planning to work in the area in the future. Lasers found application in materials processing practically since their invention in 1960, and are currently used widely in manufacturing. The main driving force behind this fact is that the lasers can provide unique solutions in material processing with high quality, high efficiency, high flexibility, high resolution, versatility and low environmental load. Macro-processing based on thermal process using infrared lasers such as CO2 lasers has been the mainstream in the early stages, while research and development of micro- and nano-processing are becoming increasingly more active as short wavelength and/or short pulse width lasers have been developed. In particular, recent advances in ultrafast lasers have opened up a new avenue to laser material processing due to the capabilities of ultrahigh precision micro- and nanofabrication of diverse materials. This handbook is the first book covering the basics, the state-of-the-art and important applications of the dynamic and rapidly expanding discipline of laser micro- and nanoengineering. This comprehensive source makes readers familiar with a broad spectrum of approaches to solve all relevant problems in science and technology. This handbook is the ultimate desk reference for all people working in the field.

Author: Dirk Basting
Publisher: Springer Science & Business Media
ISBN: 9783540200567
Category : Science
Languages : en
Pages : 462

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Book Description
This comprehensive survey on Excimer Lasers investigates the current range of the technology, applications and devices of this commonly used laser source, as well as the future of new technologies, such as F2 laser technology. Additional chapters on optics, devices and laser systems complete this compact handbook. A must read for laser technology students, process application researchers, engineers or anyone interested in excimer laser technology. An effective and understandable introduction to the current and future status of excimer laser technology.

Author: L.D. Laude
Publisher: Springer Science & Business Media
ISBN: 9401581045
Category : Technology & Engineering
Languages : en
Pages : 491

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Book Description
Among the many intense light sources, excimer lasers have a unique set of properties that place them at the forefront of tooling for material processing. Their extreme versatility means that they can be used in many areas of materials science and medicine. But three conditions need to be fulfilled in order that their versatility be truly appreciated and exploited: the characteristics and limitations of the sources must be known; the basic excimer laser processes should become reasonably widely known; and problems in search of a solution should be clearly identified. Excimer Lasers covers all three of these points in an instructive and logical way. Probably for the first time, both instrumental and fundamental aspects of excimer laser interaction with matter are presented side-by-side, with examples drawn from the widest range of materials. The articles gathered here are tutorial in their nature, thus making them suitable for a wide readership, from recent graduates and postgraduate students to those established scientists entering the field, all of whom could not find a better, nor more authoritative work with which to start their reading.

Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 9780819458452
Category : Art
Languages : en
Pages : 1104

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Book Description
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.

Author: Bruce W. Smith
Publisher: CRC Press
ISBN: 1420051539
Category : Technology & Engineering
Languages : en
Pages : 864

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Book Description
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.

Author: Daniel J. Ehrlich
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 208

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Book Description