Basic Principles Of Plasma Physics PDF Download

Author: Setsuo Ichimaru
Publisher: CRC Press
ISBN: 0429970668
Category : Science
Languages : en
Pages : 352

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Book Description
The book describes a statistical approach to the basics of plasma physics.

Author: Nicholas A. Krall
Publisher: San Francisco Press, Incorporated
ISBN:
Category : Science
Languages : en
Pages : 692

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Book Description

Author: Umran S. Inan
Publisher: Cambridge University Press
ISBN: 1139492241
Category : Science
Languages : en
Pages : 285

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Book Description
This unified introduction provides the tools and techniques needed to analyze plasmas and connects plasma phenomena to other fields of study. Combining mathematical rigor with qualitative explanations, and linking theory to practice with example problems, this is a perfect textbook for senior undergraduate and graduate students taking one-semester introductory plasma physics courses. For the first time, material is presented in the context of unifying principles, illustrated using organizational charts, and structured in a successive progression from single particle motion, to kinetic theory and average values, through to collective phenomena of waves in plasma. This provides students with a stronger understanding of the topics covered, their interconnections, and when different types of plasma models are applicable. Furthermore, mathematical derivations are rigorous, yet concise, so physical understanding is not lost in lengthy mathematical treatments. Worked examples illustrate practical applications of theory and students can test their new knowledge with 90 end-of-chapter problems.

Author: Setsuo Ichimaru
Publisher: CRC Press
ISBN: 0429965702
Category : Science
Languages : en
Pages : 408

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Book Description
Plasma physics is an integral part of statistical physics, complete with its own basic theories. Designed as a two-volume set, Statistical Plasma Physics is intended for advanced undergraduate and beginning graduate courses on plasma and statistical physics, and as such, its presentation is self-contained and should be read without difficulty by those with backgrounds in classical mechanics, electricity and magnetism, quantum mechanics, and statistics. Major topics include: plasma phenomena in nature, kinetic equations, plasmas and dielectric media, electromagnetic properties of Vlasov plasmas in thermodynamic equilibria, transient processes, and instabilities.

Author: Paul M. Bellan
Publisher: Cambridge University Press
ISBN: 1139449737
Category : Science
Languages : en
Pages : 16

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Book Description
This rigorous explanation of plasmas is relevant to diverse plasma applications such as controlled fusion, astrophysical plasmas, solar physics, magnetospheric plasmas, and plasma thrusters. More thorough than previous texts, it exploits new powerful mathematical techniques to develop deeper insights into plasma behavior. After developing the basic plasma equations from first principles, the book explores single particle motion with particular attention to adiabatic invariance. The author then examines types of plasma waves and the issue of Landau damping. Magnetohydrodynamic equilibrium and stability are tackled with emphasis on the topological concepts of magnetic helicity and self-organization. Advanced topics follow, including magnetic reconnection, nonlinear waves, and the Fokker–Planck treatment of collisions. The book concludes by discussing unconventional plasmas such as non-neutral and dusty plasmas. Written for beginning graduate students and advanced undergraduates, this text emphasizes the fundamental principles that apply across many different contexts.

Author: Setsuo Ichimaru
Publisher: CRC Press
ISBN: 0429981740
Category : Science
Languages : en
Pages : 160

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Book Description
The book describes a statistical approach to the basics of plasma physics.

Author: Francis F. Chen
Publisher: Springer Science & Business Media
ISBN: 1475755953
Category : Science
Languages : en
Pages : 427

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Book Description
TO THE SECOND EDITION In the nine years since this book was first written, rapid progress has been made scientifically in nuclear fusion, space physics, and nonlinear plasma theory. At the same time, the energy shortage on the one hand and the exploration of Jupiter and Saturn on the other have increased the national awareness of the important applications of plasma physics to energy production and to the understanding of our space environment. In magnetic confinement fusion, this period has seen the attainment 13 of a Lawson number nTE of 2 x 10 cm -3 sec in the Alcator tokamaks at MIT; neutral-beam heating of the PL T tokamak at Princeton to KTi = 6. 5 keV; increase of average ß to 3%-5% in tokamaks at Oak Ridge and General Atomic; and the stabilization of mirror-confined plasmas at Livermore, together with injection of ion current to near field-reversal conditions in the 2XIIß device. Invention of the tandem mirror has given magnetic confinement a new and exciting dimension. New ideas have emerged, such as the compact torus, surface-field devices, and the EßT mirror-torus hybrid, and some old ideas, such as the stellarator and the reversed-field pinch, have been revived. Radiofrequency heat ing has become a new star with its promise of dc current drive. Perhaps most importantly, great progress has been made in the understanding of the MHD behavior of toroidal plasmas: tearing modes, magnetic Vll Vlll islands, and disruptions.

Author: Francis F. Chen
Publisher: Springer Science & Business Media
ISBN: 1461501814
Category : Science
Languages : en
Pages : 213

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Book Description
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Author: Hartmut Frey
Publisher: Springer Science & Business Media
ISBN: 3642054307
Category : Technology & Engineering
Languages : en
Pages : 380

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Book Description
“Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.

Author: I. H. Hutchinson
Publisher: Cambridge University Press
ISBN: 9780521675741
Category : Science
Languages : en
Pages : 460

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Book Description
This book provides a systematic introduction to the physics of plasma diagnostics measurements. It develops from first principles the concepts needed to plan, execute and interpret plasma measurements, making it a suitable book for graduate students and professionals with little plasma physics background. The book will also be a valuable reference for seasoned plasma physicists, both experimental and theoretical, as well as those with an interest in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field.