Design for Manufacturability with Advanced Lithography PDF Download

Author: Bei Yu
Publisher: Springer
ISBN: 3319203851
Category : Technology & Engineering
Languages : en
Pages : 164

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Book Description
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

Author: Artur Balasinski
Publisher: Springer Science & Business Media
ISBN: 1461417619
Category : Technology & Engineering
Languages : en
Pages : 283

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Book Description
This book explains integrated circuit design for manufacturability (DfM) at the product level (packaging, applications) and applies engineering DfM principles to the latest standards of product development at 22 nm technology nodes. It is a valuable guide for layout designers, packaging engineers and quality engineers, covering DfM development from 1D to 4D, involving IC design flow setup, best practices, links to manufacturing and product definition, for process technologies down to 22 nm node, and product families including memories, logic, system-on-chip and system-in-package.

Author: Charles Chiang
Publisher: Springer Science & Business Media
ISBN: 1402051883
Category : Technology & Engineering
Languages : en
Pages : 255

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Book Description
This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.

Author: Seongbo Shim
Publisher: Springer
ISBN: 331976294X
Category : Technology & Engineering
Languages : en
Pages : 138

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Book Description
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

Author: Michael Orshansky
Publisher: Springer Science & Business Media
ISBN: 0387690115
Category : Technology & Engineering
Languages : en
Pages : 319

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Book Description
Design for Manufacturability and Statistical Design: A Comprehensive Approach presents a comprehensive overview of methods that need to be mastered in understanding state-of-the-art design for manufacturability and statistical design methodologies. Broadly, design for manufacturability is a set of techniques that attempt to fix the systematic sources of variability, such as those due to photolithography and CMP. Statistical design, on the other hand, deals with the random sources of variability. Both paradigms operate within a common framework, and their joint comprehensive treatment is one of the objectives of this book and an important differentation.

Author: Roel Gronheid
Publisher: Woodhead Publishing
ISBN: 0081002610
Category : Technology & Engineering
Languages : en
Pages : 328

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Book Description
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields

Author: Ban P. Wong
Publisher: John Wiley & Sons
ISBN: 0470382813
Category : Technology & Engineering
Languages : en
Pages : 408

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Book Description
Discover innovative tools that pave the way from circuit and physical design to fabrication processing Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions. This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts: Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.

Author: Wynand Lambrechts
Publisher: CRC Press
ISBN: 1351248669
Category : Computers
Languages : en
Pages : 354

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Book Description
This book provides a methodological understanding of the theoretical and technical limitations to the longevity of Moore’s law. The book presents research on factors that have significant impact on the future of Moore’s law and those factors believed to sustain the trend of the last five decades. Research findings show that boundaries of Moore’s law primarily include physical restrictions of scaling electronic components to levels beyond that of ordinary manufacturing principles and approaching the bounds of physics. The research presented in this book provides essential background and knowledge to grasp the following principles: Traditional and modern photolithography, the primary limiting factor of Moore’s law Innovations in semiconductor manufacturing that makes current generation CMOS processing possible Multi-disciplinary technologies that could drive Moore's law forward significantly Design principles for microelectronic circuits and components that take advantage of technology miniaturization The semiconductor industry economic market trends and technical driving factors The complexity and cost associated with technology scaling have compelled researchers in the disciplines of engineering and physics to optimize previous generation nodes to improve system-on-chip performance. This is especially relevant to participate in the increased attractiveness of the Internet of Things (IoT). This book additionally provides scholarly and practical examples of principles in microelectronic circuit design and layout to mitigate technology limits of previous generation nodes. Readers are encouraged to intellectually apply the knowledge derived from this book to further research and innovation in prolonging Moore’s law and associated principles.

Author: Tian-Hao Yan
Publisher: Elsevier
ISBN: 0323917135
Category : Architecture
Languages : en
Pages : 370

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Book Description
Advanced Nanomaterials and Their Applications in Renewable Energy, Second Edition presents timely topics related to nanomaterials' feasible synthesis and characterization and their application in the energy fields. The book examines the broader aspects of energy use, including environmental effects of disposal of Li-ion and Na batteries and reviews the main energy sources of today and tomorrow, from fossil fuels to biomass, hydropower, storage power and solar energy. The monograph treats energy carriers globally in terms of energy storage, transmission, and distribution, addresses fuel cell-based solutions in transportation, industrial, and residential building, considers synergistic systems, and more. This new edition also offers updated statistical data and references; a new chapter on the synchronous x-ray based analysis techniques and electron tomography, and if waste disposal of energy materials pose a risk to the microorganism in water, and land use; expanding coverage of renewable energy from the first edition; with newer color illustrations. Provides a comprehensive review of solar energy, fuel cells and gas storage from 2010 to the present Reviews feasible synthesis and modern analytical techniques used in alternative energy Explores examples of research in alternative energy, including current assessments of nanomaterials and safety Contains a glossary of terms, units and historical benchmarks Presents a useful guide that will bring readers up-to-speed on historical developments in alternative fuel cells

Author: O. Molloy
Publisher: Springer Science & Business Media
ISBN: 0412781905
Category : Technology & Engineering
Languages : en
Pages : 228

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Book Description
In order to compete in the current commercial environment companies must produce greater product variety, at lower cost, all within a reduced product life cycle. To achieve this, a concurrent engineering philosophy is often adopted. In many cases the main realization of this is Design for Manufacture and Assembly (DFM/A). There is a need for in-depth study of the architectures for DFM/A systems in order that the latest software and knowledge-based techniques may be used to deliver the DFM/A systems of tomorrow. This architecture must be based upon complete understanding of the issues involved in integrating the design and manufacturing domains. This book provides a comprehensive view of the capabilities of advanced DFM/A systems based on a common architecture.