Author: Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Maskless lithography system and method with doubled throughput
Author: Official Gazette of the United States Patent and Trademark Office
Author: United States. Patent and Trademark OfficePublisher:
ISBN:
Category : Patents
Languages : en
Pages : 1434
Book Description
Moving exposure system and method for maskless lithography ...
Author: Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology
Author: Luciano LavagnoPublisher: CRC Press
ISBN: 1482254611
Category : Technology & Engineering
Languages : en
Pages : 786
Book Description
The second of two volumes in the Electronic Design Automation for Integrated Circuits Handbook, Second Edition, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology thoroughly examines real-time logic (RTL) to GDSII (a file format used to transfer data of semiconductor physical layout) design flow, analog/mixed signal design, physical verification, and technology computer-aided design (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability (DFM) at the nanoscale, power supply network design and analysis, design modeling, and much more. New to This Edition: Major updates appearing in the initial phases of the design flow, where the level of abstraction keeps rising to support more functionality with lower non-recurring engineering (NRE) costs Significant revisions reflected in the final phases of the design flow, where the complexity due to smaller and smaller geometries is compounded by the slow progress of shorter wavelength lithography New coverage of cutting-edge applications and approaches realized in the decade since publication of the previous edition—these are illustrated by new chapters on 3D circuit integration and clock design Offering improved depth and modernity, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology provides a valuable, state-of-the-art reference for electronic design automation (EDA) students, researchers, and professionals.
High Performance and Optimum Design of Structures and Materials
Author: W. P. De WildePublisher: WIT Press
ISBN: 1845647742
Category : Technology & Engineering
Languages : en
Pages : 705
Book Description
The use of novel materials and new structural concepts nowadays is not restricted to highly technical areas like aerospace, aeronautical applications or the automotive industry, but affects all engineering fields including those such as civil engineering and architecture. Addressing issues involving advanced types of structures, particularly those based on new concepts or new materials and their system design, contributions highlight the latest developments in design, optimisation, manufacturing and experimentation. Also included are contributions on new software, numerical methods and different optimisation techniques. Optimisation problems of interest involve those related to size, shape and topology of structures and materials. Most high performance structures require the development of a generation of new materials, which can more easily resist a range of external stimuli or react in a non-conventional manner. Particular emphasis is placed on intelligent structures and materials as well as the application of computational methods for their modelling, control and management. Optimisation techniques have much to offer to those involved in the design of new industrial products. The formulation of optimum design has evolved from the time it was purely an academic topic, able now to satisfy the requirements of real life prototypes. The development of new algorithms and the appearance of powerful commercial computer codes, with easy to use graphical interfaces, have created a fertile field for the incorporation of optimisation in the design process in all engineering disciplines. This proceedings volume is the first from a new edition of the High Performance Design of Structures and Materials and the Optimum Design of Structures conferences, which follows the success of a number of meetings that originated in 1989. Topics covered include: Composite materials & structures; Material characterisation; Experiments and numerical analysis; Steel structures; High performance concretes; Natural fibre composites; Transformable structures; Lightweight structures; Timber structures; Environmentally friendly and sustainable structures; Emerging structural applications; Optimisation in civil engineering; Evolutionary methods in optimisation; Shape and topology optimisation; Aerospace structures; Structural optimisation; Biomechanics application; Material optimisation; Life cost optimisation; Intelligence structures and smart materials.
Novel Optical Technologies for Nanofabrication
Author: Qian LiuPublisher: Springer Science & Business Media
ISBN: 3642403875
Category : Technology & Engineering
Languages : en
Pages : 267
Book Description
Novel Optical Technologies for Nanofabrication describes recent advances made in micro/nanofabrication with super-resolution laser technologies, which are based on the latest research findings in the authors’ groups. It focuses on new techniques and methods as well as applications and development trends in laser nanofabrication, including super-resolution laser direct writing, surface structures composed of laser path-guided wrinkle, three-dimensional laser nanofabrication based on two-photon absorption, and nanofabrication by laser interference and surface plasmon polaritons. This book serves as a reference for academic researchers, engineers, technical professionals and graduate students in the fields of micro/nanotechnology, thin film materials, super-resolution optics and laser techniques. Qian Liu is a Professor at Laboratory for Nanodevice, National Center for Nanoscience and Technology, China. Xuanming Duan is a Professor at the Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, China Changsi Peng is a Professor at the Institute of Information Optical Engineering, Soochow University, China.
Index of Patents Issued from the United States Patent and Trademark Office
Author: Laser Heat-Mode Lithography
Author: Jingsong WeiPublisher: Springer Nature
ISBN: 9811509433
Category : Science
Languages : en
Pages : 215
Book Description
This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size. Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc.
Method and apparatus for patterning and imaging member
Author: Solid State Research
Author: Lincoln LaboratoryPublisher:
ISBN:
Category : Solids
Languages : en
Pages : 318
Book Description