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Author: Ladislav Bardos Publisher: John Wiley & Sons ISBN: 111982687X Category : Technology & Engineering Languages : en Pages : 212
Book Description
A practical introduction to microwave plasma for processing applications at a variety of pressures In Microwave Plasma Sources and Methods in Processing Technology, the authors deliver a comprehensive introduction to microwaves and microwave-generated plasmas. Ideal for anyone interested in non-thermal gas discharge plasmas and their applications, the book includes detailed descriptions, explanations, and practical guidance for the study and use of microwave power, microwave components, plasma, and plasma generation. This reference includes over 130 full-color diagrams to illustrate the concepts discussed within. The distinguished authors discuss the plasmas generated at different levels of power, as well as their applications at reduced, atmospheric and higher pressures. They also describe plasmas inside liquids and plasma interactions with combustion flames. Microwave Plasma Sources and Methods in Processing Technology concludes with an incisive exploration of new trends in the study and application of microwave discharges, offering promising new areas of study. The book also includes: • A thorough introduction to the basic principles of microwave techniques and power systems, including a history of the technology, microwave generators, waveguides, and wave propagation • A comprehensive exploration of the fundamentals of the physics of gas discharge plasmas, including plasma generation, Townsend coefficients, and the Paschen curve • Practical discussions of the interaction between plasmas and solid surfaces and gases, including PVD, PE CVD, oxidation, sputtering, evaporation, dry etching, surface activation, and cleaning • In-depth examinations of microwave plasma systems for plasma processing at varied parameters Perfect for researchers and engineers in the microwave community, as well as those who work with plasma applications, Microwave Plasma Sources and Methods in Processing Technology will also earn a place in the libraries of graduate and PhD students studying engineering physics, microwave engineering, and plasmas.
Author: Ladislav Bardos Publisher: John Wiley & Sons ISBN: 111982687X Category : Technology & Engineering Languages : en Pages : 212
Book Description
A practical introduction to microwave plasma for processing applications at a variety of pressures In Microwave Plasma Sources and Methods in Processing Technology, the authors deliver a comprehensive introduction to microwaves and microwave-generated plasmas. Ideal for anyone interested in non-thermal gas discharge plasmas and their applications, the book includes detailed descriptions, explanations, and practical guidance for the study and use of microwave power, microwave components, plasma, and plasma generation. This reference includes over 130 full-color diagrams to illustrate the concepts discussed within. The distinguished authors discuss the plasmas generated at different levels of power, as well as their applications at reduced, atmospheric and higher pressures. They also describe plasmas inside liquids and plasma interactions with combustion flames. Microwave Plasma Sources and Methods in Processing Technology concludes with an incisive exploration of new trends in the study and application of microwave discharges, offering promising new areas of study. The book also includes: • A thorough introduction to the basic principles of microwave techniques and power systems, including a history of the technology, microwave generators, waveguides, and wave propagation • A comprehensive exploration of the fundamentals of the physics of gas discharge plasmas, including plasma generation, Townsend coefficients, and the Paschen curve • Practical discussions of the interaction between plasmas and solid surfaces and gases, including PVD, PE CVD, oxidation, sputtering, evaporation, dry etching, surface activation, and cleaning • In-depth examinations of microwave plasma systems for plasma processing at varied parameters Perfect for researchers and engineers in the microwave community, as well as those who work with plasma applications, Microwave Plasma Sources and Methods in Processing Technology will also earn a place in the libraries of graduate and PhD students studying engineering physics, microwave engineering, and plasmas.
Author: Hana Barankova Publisher: John Wiley & Sons ISBN: 1119826896 Category : Technology & Engineering Languages : en Pages : 208
Book Description
A practical introduction to microwave plasma for processing applications at a variety of pressures In Microwave Plasma Sources and Methods in Processing Technology, the authors deliver a comprehensive introduction to microwaves and microwave-generated plasmas. Ideal for anyone interested in non-thermal gas discharge plasmas and their applications, the book includes detailed descriptions, explanations, and practical guidance for the study and use of microwave power, microwave components, plasma, and plasma generation. This reference includes over 130 full-color diagrams to illustrate the concepts discussed within. The distinguished authors discuss the plasmas generated at different levels of power, as well as their applications at reduced, atmospheric and higher pressures. They also describe plasmas inside liquids and plasma interactions with combustion flames. Microwave Plasma Sources and Methods in Processing Technology concludes with an incisive exploration of new trends in the study and application of microwave discharges, offering promising new areas of study. The book also includes: • A thorough introduction to the basic principles of microwave techniques and power systems, including a history of the technology, microwave generators, waveguides, and wave propagation • A comprehensive exploration of the fundamentals of the physics of gas discharge plasmas, including plasma generation, Townsend coefficients, and the Paschen curve • Practical discussions of the interaction between plasmas and solid surfaces and gases, including PVD, PE CVD, oxidation, sputtering, evaporation, dry etching, surface activation, and cleaning • In-depth examinations of microwave plasma systems for plasma processing at varied parameters Perfect for researchers and engineers in the microwave community, as well as those who work with plasma applications, Microwave Plasma Sources and Methods in Processing Technology will also earn a place in the libraries of graduate and PhD students studying engineering physics, microwave engineering, and plasmas.
Author: Oleg A. Popov Publisher: Elsevier ISBN: 0815517890 Category : Technology & Engineering Languages : en Pages : 465
Book Description
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Author: National Research Council Publisher: National Academies Press ISBN: 0309050278 Category : Technology & Engineering Languages : en Pages : 165
Book Description
Microwaves can be effectively used in the processing of industrial materials under a wide range of conditions. However, microwave processing is complex and multidisciplinary in nature, and a high degree of technical knowledge is needed to determine how, when, and where the technology can be most profitably utilized. This book assesses the potential of microwave technology for industrial applications, reviews the latest equipment and processing methods, and identifies both the gaps in understanding of microwave processing technology and the promising development opportunities that take advantage of this new technology's unique performance characteristics.
Author: Paul K. Chu Publisher: CRC Press ISBN: 1466509902 Category : Science Languages : en Pages : 497
Book Description
Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown spectroscopy, and laser-induced fluorescence measurement, and explores the increasing research on atmospheric pressure nonequilibrium plasma jets. The authors also discuss how low temperature plasmas are used in the synthesis of nanomaterials, environmental applications, the treatment of biomaterials, and plasma medicine. This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It is accessible to scientists and graduate students in low-pressure plasma physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students.
Author: H. Schlüter Publisher: Springer Science & Business Media ISBN: 9401706336 Category : Science Languages : en Pages : 580
Book Description
This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It lays a foundation for the application of sources in industry and various research areas
Author: Carlos M. Ferreira Publisher: Springer ISBN: Category : Medical Languages : en Pages : 584
Book Description
This book is the result of a NATO Advanced Research Workshop held in Vimeiro, Portugal, in May 1992. The objectives of this Workshop were: i) to promote exchange of knowledge between experts in various fields of discharge modeling, plasma diagnostics and microwave plasma applications; ii) to assess the state-of-the-art in this field from a multidisciplinary viewpoint; iii) to identify basic points needing clarification and to estab lish basic guidelines for future research; iv) to compare the properties of microwave dis charges to those of RF discharges, as plasma sources for specific applications. Most of the contributors to this book are well known scientists in the field of mi crowave discharge sources, modeling, diagnostics and applications. The book provides an up-to-date review in this field which should be useful for both the fundamentalists and those using these systems in applications such as surface treatment and elemental analysis. We are gmteful to a number of organizations for providing the fmancial assistance that made the Workshop possible. Foremost is the NATO Scientific Affairs Division, which provided the major contribution for the Workshop. In addition, the following Por tuguese sources made contributions: Instituto Nacional de Investiga~iio Cientifica, Junta Nacional de Investiga~iio Cientifica e Tecnologica, Centro de Electrodinamica da Univer sidade Tecnica de Lisboa, Instituto Superior Tecnico, Banco Nacional Ultmmarino, and Regiiio de Turismo do Oeste.
Author: J Reece Roth Publisher: Routledge ISBN: 1351438700 Category : Science Languages : en Pages : 770
Book Description
Written by a leading expert in the field, the paperback edition of Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers.
Author: Sudeep Bhattacharjee Publisher: Taylor & Francis ISBN: 1466557885 Category : Science Languages : en Pages : 394
Book Description
Recent research has brought the application of microwaves from the classical fields of heating, communication, and generation of plasma discharges into the generation of compact plasmas that can be used for applications such as FIB and small plasma thrusters. However, these new applications bring with them a new set of challenges. With coverage ranging from the basics to new and emerging applications, Compact Plasma and Focused Ion Beams discusses how compact high-density microwave plasmas with dimensions smaller than the geometrical cutoff dimension can be generated and utilized for providing focused ion beams of various elements. Starting with the fundamentals of the cutoff problem for wave propagation in waveguides and plasma diagnostics, the author goes on to explain in detail the plasma production by microwaves in a compact geometry and narrow tubes. He then thoroughly discusses wave interaction with bounded plasmas and provides a deeper understanding of the physics. The book concludes with an up-to-date account of recent research on pulsed microwaves and the application of compact microwave plasmas for multi-element FIB. It provides a consolidated and unified description of the emerging areas in plasma science and technology utilizing wave-based plasma sources based on the author’s own work and experience. The book will be useful not only to established researchers in this area but will also serve as an excellent introduction to those interested in applying these ideas to various current and new applications.
Author: Yu A. Lebedev Publisher: Wexford College Press ISBN: 9781934939086 Category : Microwave plasmas Languages : en Pages : 0
Book Description
Specialists in different areas of microwave plasma physics, technique, and plasma processing cover all problems of theory, experiments, and applications of microwave discharges, and yield the state-of-the-art trends.
Author: Ladislav Bardos
Author: Ladislav Bardos
Author: Hana Barankova
Author: Oleg A. Popov
Author: National Research Council
Author: Paul K. Chu
Author: H. Schlüter
Author: Carlos M. Ferreira
Author: J Reece Roth
Author: Sudeep Bhattacharjee
Author: Yu A. Lebedev