The Physics and Technology of Ion Sources PDF Download

Author: Ian G. Brown
Publisher: Wiley-VCH
ISBN:
Category : Science
Languages : en
Pages : 472

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Book Description
The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.

Author: Ian G. Brown
Publisher: John Wiley & Sons
ISBN: 3527604545
Category : Science
Languages : en
Pages : 396

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Book Description
The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.

Author: Viacheslav V. Zhurin
Publisher: John Wiley & Sons
ISBN: 3527635734
Category : Science
Languages : en
Pages : 326

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Book Description
Due to the large number of uses of ion sources in academia and industry, those who utilize these sources need up to date and coherent information to keep themselves abreast of developments and options, and to chose ideal solutions for quality and cost-effectiveness. This book, written by an author with a strong industrial background and excellent standing, is the comprehensive guide users and developers of ion sources have been waiting for. Providing a thorough refresher on the physics involved, this resource systematically covers the source types, components, and the operational parameters.

Author: Jon Orloff
Publisher: Springer Science & Business Media
ISBN: 1461507650
Category : Technology & Engineering
Languages : en
Pages : 304

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Book Description
In this book, we have attempted to produce a reference on high resolution focused ion beams (FIBs) that will be useful for both the user and the designer of FIB instrumentation. We have included a mix of theory and applications that seemed most useful to us. The field of FIBs has advanced rapidly since the application of the first field emission ion sources in the early 1970s. The development of the liquid metal ion source (LMIS) in the late 1960s and early 1970s and its application for FIBs in the late 1970s have resulted in a powerful tool for research and for industry. There have been hundreds of papers written on many aspects of LMIS and FIBs, and a useful and informative book on these subjects was published in 1991 by Phil Prewett and Grame Mair. Because there have been so many new applications and uses found for FIBs in the last ten years we felt that it was time for another book on the subject.

Author: R Geller
Publisher: Routledge
ISBN: 135145322X
Category : Science
Languages : en
Pages : 351

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Book Description
Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour

Author: R Geller
Publisher: CRC Press
ISBN: 9780750301077
Category : Science
Languages : en
Pages : 456

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Book Description
Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sources as well as being a reference to the field of ion source developments. Coverage includes elements of plasma physics, specific electron cyclotron resonance physics, and the relevant technology directed at both scientists and engineers.

Author: Huashun Zhang
Publisher: Springer
ISBN: 9783540657477
Category : Science
Languages : en
Pages : 0

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Book Description
While dealing with the design and operation of ion sources, this book additionally discusses the physics of ion formation of the various elements with different charge states and charge neutralization. Ion selection and beam diagnostics are equally included, and the presentation of the necessary equations and diagrams for the various parameters makes this a useful handbook for ion sources.

Author: Ragnar Hellborg
Publisher: Morgan & Claypool Publishers
ISBN: 1643273566
Category : Science
Languages : en
Pages : 150

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Book Description
Electrostatic Accelerators have been at the forefront of modern technology since the development by Sir John Cockroft and Ernest Walton in 1932 of the first accelerator, which was the first to achieve nuclear transmutation and earned them the Nobel Prize in Physics in 1951. The applications of Cockroft and Walton's development have been far reaching, even into our kitchens where it is employed to generate the high voltage needed for the magnetron in microwave ovens. Other electrostatic accelerator related Nobel prize winning developments that have had a major socio-economic impact are; the electron microscope where the beams of electrons are produced by an electrostatic accelerator, X-rays and computer tomography (CT) scanners where the X-rays are produced using an electron accelerator and microelectronic technology where ion implantation is used to dope the semiconductor chips which form the basis of our computers, mobile phones and entertainment systems. Although the Electrostatic Accelerator field is over 90 years old, and only a handful of accelerators are used for their original purpose in nuclear physics, the field and the number of accelerators is growing more rapidly than ever. The objective of this book is to collect together the basic science and technology that underlies the Electrostatic Accelerator field so it can serve as a handbook, reference guide and textbook for accelerator engineers as well as students and researchers who work with Electrostatic Accelerators.

Author: J.F. Ziegler
Publisher: Elsevier
ISBN: 0323144012
Category : Science
Languages : en
Pages : 649

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Book Description
Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.

Author: Vadim Dudnikov
Publisher: Springer Nature
ISBN: 3030284379
Category : Science
Languages : en
Pages : 346

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Book Description
This book describes the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.