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Author: Sumio Hosaka Publisher: BoD – Books on Demand ISBN: 9535111752 Category : Science Languages : en Pages : 264
Book Description
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.
Author: Sumio Hosaka Publisher: BoD – Books on Demand ISBN: 9535111752 Category : Science Languages : en Pages : 264
Book Description
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.
Author: Bei Yu Publisher: Springer ISBN: 3319203851 Category : Technology & Engineering Languages : en Pages : 164
Book Description
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
Author: Tommaso Baldacchini Publisher: William Andrew ISBN: 032335405X Category : Technology & Engineering Languages : en Pages : 512
Book Description
Three-Dimensional Microfabrication Using Two-Photon Polymerization (TPP) is the first comprehensive guide to TPP microfabrication—essential reading for researchers and engineers in areas where miniaturization of complex structures is key, such as in the optics, microelectronics, and medical device industries. TPP stands out among microfabrication techniques because of its versatility, low costs, and straightforward chemistry. TPP microfabrication attracts increasing attention among researchers and is increasingly employed in a range of industries where miniaturization of complex structures is crucial: metamaterials, plasmonics, tissue engineering, and microfluidics, for example. Despite its increasing importance and potential for many more applications, no single book to date is dedicated to the subject. This comprehensive guide, edited by Professor Baldacchini and written by internationally renowned experts, fills this gap and includes a unified description of TPP microfabrication across disciplines. The guide covers all aspects of TPP, including the pros and cons of TPP microfabrication compared to other techniques, as well as practical information on material selection, equipment, processes, and characterization. Current and future applications are covered and case studies provided as well as challenges for adoption of TPP microfabrication techniques in other areas are outlined. The freeform capability of TPP is illustrated with numerous scanning electron microscopy images. Comprehensive account of TPP microfabrication, including both photophysical and photochemical aspects of the fabrication process Comparison of TPP microfabrication with conventional and unconventional micromanufacturing techniques Covering applications of TPP microfabrication in industries such as microelectronics, optics and medical devices industries, and includes case studies and potential future directions Illustrates the freeform capability of TPP using numerous scanning electron microscopy images
Author: Yayi Wei Publisher: SPIE Press ISBN: 0819475572 Category : Art Languages : en Pages : 338
Book Description
This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as course material for graduate students of electrical engineering, material sciences, physics, chemistry, and microelectronics engineering and can also be used to train engineers involved in the manufacture of integrated circuits. It provides techniques for selecting critical materials (topcoats, photoresists, and antireflective coatings) and optimizing immersion processes to ensure higher performance and lower defectivity at lower cost. This book also includes sections on shrinking, trimming, and smoothing of the resist pattern to reduce feature sizes and line-edge roughness. Finally, it describes the recent development of 193i in combination with double exposure and double patterning.
Author: Bo Cui Publisher: BoD – Books on Demand ISBN: 953307602X Category : Science Languages : en Pages : 630
Book Description
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Author: Publisher: ScholarlyEditions ISBN: 1481684108 Category : Science Languages : en Pages : 851
Book Description
Advances in Silicon Dioxide Research and Application: 2013 Edition is a ScholarlyEditions™ book that delivers timely, authoritative, and comprehensive information about Diatomaceous Earth. The editors have built Advances in Silicon Dioxide Research and Application: 2013 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about Diatomaceous Earth in this book to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Advances in Silicon Dioxide Research and Application: 2013 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.
Author: Seongbo Shim Publisher: Springer ISBN: 331976294X Category : Technology & Engineering Languages : en Pages : 138
Book Description
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Author: Stefan Landis Publisher: John Wiley & Sons ISBN: 1118621182 Category : Technology & Engineering Languages : en Pages : 320
Book Description
Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components.
Author: Sumio Hosaka
Author: Sumio Hosaka
Author: Bei Yu
Author: Tommaso Baldacchini
Author: Yayi Wei
Author: Bo Cui
Author: 
Author: Seongbo Shim
Author: 
Author: Semiconductor Equipment and Materials International
Author: Stefan Landis